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| Determination of diffusion coefficients of hydrogen in fused silica between 296 and 523 K by Raman spectroscopy and application of fused silica capillaries in studying redox reactions | |||
|---|---|---|---|
| 등록번호 | H0107318015 | 저널명 | Determination of diffusion coefficients of hydrogen in fused silica between 296 and 523 K by Raman spectroscopy and application of fused silica capillaries in studying redox reactions |
| 권 | 073 | 호 | 18 |
| Page | 5435~5443 | Year | 2009 |
| 제목 | Determination of diffusion coefficients of hydrogen in fused silica between 296 and 523 K by Raman spectroscopy and application of fused silica capillaries in studying redox reactions | 저자명 | Linbo Shang, I-Ming Chou, Wanjun Lu, Robert C. Burruss, Youxue Zhang |
| 키워드 | Determination of diffusion coefficients of hydrogen; silica between 296 and 523 K ; Raman spectroscopy; application of fused silica capillaries; studying redox reactions | URL | http://www.sciencedirect.com/science/article/pii/S0016703709003822 |
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